Substage with 10 mm travel

This compact four axis substage yields a high degree of freedom for a multitude of applications in FIB/SEM or UHV environments. Its smooth motion and rotational axis make it ideal for precision operations. In addition, the LT3310 is designed for nanomanipulation applications where weight and space are highly restricted and for high-precision work in extreme environments.

Compact and flexible

• Small and practical
• Plug-and-play system with modular components
• Interfacing solutions for most microscopes
• Fast setup and removal

Clear and simple

• Result-oriented operation and increased throughput
• Intuitive control interfaces and software
• User-friendly and easy to learn
• Compact, stand-alone electronics with PC interface
• Pioneering cabling technology

Robust and stable

• Compact construction delivers higher resonance frequencies
• Excellent stability
• Low drift (1 nm/min)
• Reliable operation (one year endurance test)
• Virtually insusceptible to vibrations
• Fast pre-positioning by hand

Fast and precise

• No backlash or reversal play
• Sub-nanometer resolution (0.25 nm)
• Integrated coarse and fine displacement in one drive
• High operating velocity (up to 10 mm/sec)
• Smooth motion

• Length: 33 mm
• Width: 33 mm
• Height: 18.6 mm
• Weight: 30 g
• Travel: XY = 10 mm, Z = 3 mm, R = 360° unlimited
• Speed: up to 1 mm/s
• Resolution: XYZ < 0.05 nm, R = 6.5 x 10^–9 rad
• Load: 50 g
• Lift: 5 g
• Temperature range: 273 K to 353 K
  UHV version: 273 K to 393 K
  Low temp. version: 77 K to 393 K
• Lowest pressure: 10^–7 mbar
  UHV version: 2 x 10^–10 mbar
• Substage mounting: 4 x 2 mm holes
• Material: Stainless steel

All technical specifications are approximate. Due to continuous development, we reserve the right to change specifications without notice.