Electron Beam Induced Deposition (EBID) and Ion Beam Induced Deposition (IBID) are common applications for depositing various materials in SEM and FIB microscope systems. In order to deposit material, a precursor gas must be introduced into the chamber. This is achieved using a Gas Injections System (GIS).
Imaging non-conductive surfaces in SEM or FIB can be challenging. One strategy for reducing the effects of charging is to introduce an inert gas such as Nitrogen or water vapor to absorb the charge and improve image quality.
The GIS-EM plug-in can deliver precisely controlled amounts of gas to the area of interest - either from the internal reservoir (e.g. filled with water) or from an external gas source.