MM3A-EM Probe Station

The MM3A-EM Probe Station comprises up to eight MM3A-EM micromanipulators combined with our long range substage with 30 mm travel in X and Y. The substage can optionally be equipped with positional encoders yielding 50 nm repeatability. Another option is to add a Z axis with a range of 3 mm.

The entire platform can be mounted on the SEM's stage in a few short minutes and just as easily be removed in order to return the microscope to its previous state.

The MM3A-EM micromanipulators are equipped with low-current, low-capacity measurement capability and are fully compatible to the Advanced Probing Tools hardware and software suite including the Live Contact Tester and Electron Beam Induced Current Imaging modules, among others.

The platform can also be fitted with a heating stage for temperatures of up to 450°C. Other customizations are available upon request (e,g, integrated LED illumination).

Compact & flexible

• Easy to install and remove for a high degree of flexibility
• Plug-and-play system with modular components
• Interfacing solutions for most SEM/FIB instruments
• Fast setup
• Ample space for large samples
• Large working range (30 mm x 30 mm substage travel)
• Pioneering cabling technology

Clear & simple

• Intuitive control interfaces and software
• User-friendly and easy to learn
• Quick and easy probe tip exchange
• Compact, stand-alone electronics
• Effortless work with multiple manipulators

Robust & stable

• Excellent stability
• Low drift (1 nm/min)
• Reliable operation (one year endurance test)
• Virtually insusceptible to vibrations
• Fast pre-positioning by hand

Fast & precise

• High operating velocity (up to 10 mm/sec)
• Sub-nanometer resolution (0.25 nm)
• No backlash or reversal play
• Extensive working range
• Coarse and fine displacement in one drive

Overview

• Total height: 31 mm
• Total width: 180 mm
• Maximum sample size: 70 mm — 70 mm, max 10 mm height
• Weight: ~1200 g

Three-axis micromanipulators

A = left / right    B = up / down    C = in / out

• Operating range: A = 240°, B = 240°, C = 12 mm
• Resolution A: 7 x 10^–9 rad (0.5 nm)
  Resolution B: 7 x 10^–9 rad (0.2 nm)
  Resolution C: < 0.05 nm
• Low drift: 1 nm/min

Low-capacity, low-current measurements

• Noise: 25 fA @ 1 Hz
• Insulation leakage current: <50 fA/V
• Signal conductor resistance: <5 Ω
• Maximum voltage: 100 V
• Maximum current: 100 mA

Substage

• Travel X and Y: 28.5 mm
• Speed: up to 2 mm/s
• Resolution: < 0.5 nm
• Repeatability: 50 nm (optional)
• Angular deviation: < 1 µrad
• Load: 500 g
• Optional Z-drive range: 3 mm
• Z Lift capability: 25 g
• Temperature range: 273 K to 353 K
  UHV version: 273 K to 393 K
• Lowest pressure: 10^-7 mbar
  UHV version: 2 x 10^-10 mbar
• Substage mounting: 4 x 3.2 mm holes
• Sample mounting: Clip or 2 x M3 holes

All technical specifications are approximate. Due to continuous development, we reserve the right to change specifications without notice.